• DocumentCode
    2685669
  • Title

    Fabry-Perot type antireflective coatings for binary mask applications in ArF and F2 excimer laser lithographies

  • Author

    Chen, H.L. ; Liu, M.C. ; Hsieh, C.I. ; Ko, F.H.

  • Author_Institution
    Nat. Nano Device Lab., Hsinchu, Taiwan
  • Volume
    2
  • fYear
    2003
  • fDate
    15-19 Dec. 2003
  • Abstract
    We demonstrated an antireflective coating structure based on a Fabry-Perot structure for binary masks of ArF and F2 excimer laser lithographies. Reflectance of less than l% at both 193 and 157 nm can be achieved.
  • Keywords
    antireflection coatings; argon compounds; excimer lasers; fluorine; masks; optical multilayers; reflectivity; ultraviolet lithography; ultraviolet spectra; 157 nm; 193 nm; ArF; ArF excimer laser; F2; F2 excimer laser; Fabry-Perot structure; antireflective coatings; binary mask; excimer laser lithographies; reflectance; Chemical lasers; Coatings; Fabry-Perot; Laser theory; Lithography; Optical films; Reflectivity; Resists; Semiconductor lasers; Writing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics, 2003. CLEO/Pacific Rim 2003. The 5th Pacific Rim Conference on
  • Print_ISBN
    0-7803-7766-4
  • Type

    conf

  • DOI
    10.1109/CLEOPR.2003.1277293
  • Filename
    1277293
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2685669