• DocumentCode
    2685766
  • Title

    High-Q on-chip inductors embedded in wafer-level package for RFIC applications

  • Author

    Feng, Tao ; Cai, Jian ; Kwon, Henri HK ; Wang, Qian ; Dou, Xinyu

  • Author_Institution
    Tsinghua Univ., Tsinghua
  • fYear
    2008
  • fDate
    28-31 July 2008
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    Wafer level packaging (WLP) technology has been used to integrate high-Q inductor on Si substrate. These inductors consist of a thick Cu electroplated rerouting to reduce series resistance and a thick dielectric layer to separate the inductors from Si substrate. The measured results show that the peak O-factor is 30 at 4 GHz for a 0.77 nH inductor, which is good agreement with the simulated performance by HFSS. Therefore, this technology realizes embedded high-Q inductors in WLP and can improve the performance of RF system.
  • Keywords
    Q-factor; electronics packaging; inductors; radiofrequency integrated circuits; silicon; RFIC applications; Si; electroplated rerouting; frequency 4 GHz; high-Q on-chip inductors; series resistance; thick dielectric layer; wafer-level package; Capacitance; Dielectric substrates; Electrical resistance measurement; Electronics packaging; Equivalent circuits; Inductors; Radio frequency; Radiofrequency integrated circuits; Spirals; Wafer scale integration;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronic Packaging Technology & High Density Packaging, 2008. ICEPT-HDP 2008. International Conference on
  • Conference_Location
    Shanghai
  • Print_ISBN
    978-1-4244-2739-0
  • Electronic_ISBN
    978-1-4244-2740-6
  • Type

    conf

  • DOI
    10.1109/ICEPT.2008.4606957
  • Filename
    4606957