DocumentCode
2686038
Title
Structure of plasma sheath in a plasma focus device
Author
Xing Xing Wang, Xing Xing Wang ; Tsin Chi Yang, Tsin Chi Yang
fYear
1990
fDate
21-23 May 1990
Firstpage
190
Lastpage
191
Abstract
Summary form only given. Experiments were conducted on a device consisting of a condenser bank with 81 μF at 20-30 kV. The propagation of the plasma sheath in the rundown phase and pinch phase was studied by laser interferometry. The di/dt signal and X-ray yield were measured at the same time. The velocity of the plasma sheath in the rundown phase reached 1.0×107 cm/s at p =0.5 torr gas pressure. It decreased to 5.5×106 cm/s at p =1.5 torr and then remained nearly unchanged up to 5 torr. The di/dt signal can be used to estimate the pinch compression. A better compression condition of the plasma gives a high di/dt value and high X-ray yield. The structure of the plasma sheath depend strongly on the gas pressure. The pinch pattern changes with the structure of the plasma sheath in the rundown phase. The structure of the plasma sheath in the rundown and pinch phases, the di/dt signal, and the X-ray yield are correlated
Keywords
plasma diagnostics; plasma focus; plasma sheaths; 0.5 to 5 torr; 20 to 30 kV; X-ray yield; condenser bank; di/dt signal; laser interferometry; pinch compression; pinch phase; plasma focus device; plasma sheath; propagation; rundown phase; structure; velocity;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 1990. IEEE Conference Record - Abstracts., 1990 IEEE International Conference on
Conference_Location
Oakland, CA, USA
Type
conf
DOI
10.1109/PLASMA.1990.110793
Filename
5726063
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