DocumentCode :
2686038
Title :
Structure of plasma sheath in a plasma focus device
Author :
Xing Xing Wang, Xing Xing Wang ; Tsin Chi Yang, Tsin Chi Yang
fYear :
1990
fDate :
21-23 May 1990
Firstpage :
190
Lastpage :
191
Abstract :
Summary form only given. Experiments were conducted on a device consisting of a condenser bank with 81 μF at 20-30 kV. The propagation of the plasma sheath in the rundown phase and pinch phase was studied by laser interferometry. The di/dt signal and X-ray yield were measured at the same time. The velocity of the plasma sheath in the rundown phase reached 1.0×107 cm/s at p=0.5 torr gas pressure. It decreased to 5.5×106 cm/s at p=1.5 torr and then remained nearly unchanged up to 5 torr. The di/dt signal can be used to estimate the pinch compression. A better compression condition of the plasma gives a high di/dt value and high X-ray yield. The structure of the plasma sheath depend strongly on the gas pressure. The pinch pattern changes with the structure of the plasma sheath in the rundown phase. The structure of the plasma sheath in the rundown and pinch phases, the di/dt signal, and the X-ray yield are correlated
Keywords :
plasma diagnostics; plasma focus; plasma sheaths; 0.5 to 5 torr; 20 to 30 kV; X-ray yield; condenser bank; di/dt signal; laser interferometry; pinch compression; pinch phase; plasma focus device; plasma sheath; propagation; rundown phase; structure; velocity;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 1990. IEEE Conference Record - Abstracts., 1990 IEEE International Conference on
Conference_Location :
Oakland, CA, USA
Type :
conf
DOI :
10.1109/PLASMA.1990.110793
Filename :
5726063
Link To Document :
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