DocumentCode :
2686323
Title :
Progress in SiGe heterostructure devices
Author :
König, U.
Author_Institution :
Res. Center, Daimler-Chrysler AG, Ulm, Germany
fYear :
1999
fDate :
36186
Firstpage :
42522
Lastpage :
42527
Abstract :
Since a few years SiGe/Si heterodevices have entered the semiconductors world. In particular, the SiGe heterobipolar transistor (SiGe HBT) has demonstrated a record fmax value of 160 GHz. The SiGe hetero-field effect transistor (SiGe HFET) is presently catching up in performance with a speed of 120 GHz. This paper reviews device and circuit results. An important issue is the compatibility to the dominating silicon technology which opens perspectives for new generations of high volume and low cost microelectronic components
Keywords :
heterojunction bipolar transistors; 120 GHz; 160 GHz; SiGe-Si; SiGe/Si heterostructure device; hetero-field effect transistor; heterobipolar transistor; microelectronic component; semiconductor;
fLanguage :
English
Publisher :
iet
Conference_Titel :
Advances in Semiconductor Devices (Ref. No. 1999/025), IEE Colloquium on
Conference_Location :
London
Type :
conf
DOI :
10.1049/ic:19990154
Filename :
755816
Link To Document :
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