DocumentCode :
2687991
Title :
The effects of immersion zincation to the electroless nickel under-bump materials in microelectronics packaging
Author :
Ng, Wing-Chau ; Ko, T.-M. ; Chen, William ; Qi, Guo-Jun
Author_Institution :
Dept. of Chem. Eng., Nat. Univ. of Singapore, Singapore
fYear :
1998
fDate :
8-10 Dec 1998
Firstpage :
89
Lastpage :
94
Abstract :
One of the methods used for flip chip mounting is by solder bumping that utilizes Ni/Au under-bump metallurgy. Electroless nickel plating has been preferred over conventional electroplating due to its simplicity, good control, and reproducibility. Experiments are carried out to determine the optimum aluminum surface conditions for nickel adhesion, through studies of surface morphology and transformation during pretreatment. Zincation baths are used to condition the aluminum surfaces for nickel plating. The effects of the period and the number of times of the zincation process on the mechanical strength of the electroless nickel deposits are investigated. From SEM and AFM characterization, transitions of zinc grain size and surface roughness are observed. Grains are large with distinct grain boundaries for immersion time of 5 s, but decrease in size and lose their characteristic shapes as the zincation time increases. A double zincation produces a more compact deposit with smaller size grains compared to single zincation. Length of immersion time during the second zincation also affects the physical properties such as shear strength after 1 hr of electroless nickel plating on the 80 μm×80 μm Al bond-pads of a commercial bare microchip. The elemental composition transitions of the zinc deposits formed by different zincation times and bath compositions are also investigated using SEM-EDX and XPS
Keywords :
X-ray chemical analysis; X-ray photoelectron spectra; adhesion; atomic force microscopy; electroless deposition; flip-chip devices; grain boundaries; grain size; integrated circuit interconnections; integrated circuit metallisation; integrated circuit packaging; microassembling; nickel; scanning electron microscopy; shear strength; surface chemistry; surface topography; surface treatment; 1 hr; 5 s; 80 micron; AFM; Al bond-pads; Au; Ni-Zn-Au; Ni/Au under-bump metallurgy; SEM; SEM-EDX; XPS; aluminum surface conditioning; bare microchip bond-pads; compact deposit; double zincation; electroless nickel deposits; electroless nickel plating; electroless nickel under-bump materials; electroplating; elemental composition transitions; flip chip mounting; grain boundaries; immersion time; immersion zincation effects; mechanical strength; microelectronics packaging; nickel adhesion; nickel plating; optimum aluminum surface conditions; pretreatment; reproducibility; shear strength; solder bumping; surface morphology; surface roughness; surface transformation; zinc deposits; zinc grain size; zinc grain size transitions; zincation bath compositions; zincation baths; zincation process; zincation time; Adhesives; Aluminum; Flip chip; Gold; Nickel; Reproducibility of results; Rough surfaces; Surface morphology; Surface roughness; Zinc;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronics Packaging Technology Conference, 1998. Proceedings of 2nd
Print_ISBN :
0-7803-5141-X
Type :
conf
DOI :
10.1109/EPTC.1998.755984
Filename :
755984
Link To Document :
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