DocumentCode :
2688581
Title :
Principle of operation and performance of 1.3 volt SOI resistor load vertical dual carrier field effect transistor flip flop fabricated for SRAM, FPGA and switching SOC with effective channel length of 30nm
Author :
Tang, Z.M. ; Li, G.H. ; Yang, Roger ; Yang, Young Hwi ; Han, D.J. ; Huang, D.H. ; Lin, C.L. ; Xu, Y.Z. ; Xu, Peng ; Zhang, J.C. ; Wu, C.L. ; Yan, F.Z. ; Ren, Y.L. ; Yu, L.K. ; Cai, I.M. ; Tian, X.N. ; Du, S.C. ; Huang, Chao
Author_Institution :
Inst. of Comput. Technol., CAS, Beijing, China
Volume :
2
fYear :
2003
fDate :
21-24 Oct. 2003
Firstpage :
1373
Abstract :
Principle of operation of resistor load SOI vertical dual carrier field effect transistor (VDCFET) flip flop is reviewed. The measured and the calculated results of the performance of the 1.3 volt resistor load SOI VDCFET flip flop, with 30nm effective channel length, are presented. These SOI VDCFET flip-flops are fabricated by using lithographic equipments for linewidths greater than 180nm. These flip flops are being designed as the main building blocks of VDCFET SRAM, FPGA and switching SOC with effective channel length of 30nm.
Keywords :
SRAM chips; field effect transistors; field programmable gate arrays; flip-flops; logic simulation; silicon-on-insulator; system-on-chip; 1.3 V; 30 nm; FPGA; SOI resistor load; SRAM; VDCFET; channel length; flip flop; lithographic equipments; switching SOC; vertical dual carrier field effect transistor;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
ASIC, 2003. Proceedings. 5th International Conference on
ISSN :
1523-553X
Print_ISBN :
0-7803-7889-X
Type :
conf
DOI :
10.1109/ICASIC.2003.1277473
Filename :
1277473
Link To Document :
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