DocumentCode :
2688724
Title :
The thermodynamic analysis of tri-isopropoxyaluminium pyrolysis
Author :
Tomilin, Vladimir I. ; Shumeyev, Vasiliy N.
Author_Institution :
Krasnoyarsk State Tech. Univ., Russia
fYear :
2000
fDate :
2000
Firstpage :
81
Lastpage :
84
Abstract :
The purpose of this paper is a theoretical examination of Al(OC 3H7)3 pyrolysis and finding of thermodynamic quantities which are necessary for optimal technological modes of pure Al2O3 films production on a GaAs surface
Keywords :
MOCVD; alumina; enthalpy; entropy; free energy; heat of formation; organometallic compounds; pyrolysis; Al2O3; GaAs; Gibbs energy; alumina films production; contamination elimination; enthalpy; entropy; optimal technological modes; temperature dependence; thermodynamic analysis; tri-isopropoxyaluminium pyrolysis; vapour pressure; Aluminum oxide; Chemical analysis; Chemical technology; Coatings; Contamination; Impedance; Optimized production technology; Solid state circuits; Temperature; Thermodynamics;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices and Materials, 2000. EDM 2000. Siberian Russian Student Workshops on
Conference_Location :
Novosibirsk
Print_ISBN :
5-7782-0291-1
Type :
conf
DOI :
10.1109/SREDM.2000.888558
Filename :
888558
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2688724
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