DocumentCode :
268922
Title :
Thin-Film Silicon Triple-Junction Solar Cells on Highly Transparent Front Electrodes With Stabilized Efficiencies up to 12.8%
Author :
Schuttauf, Jan-Willem ; Bugnon, Gregory ; Stuckelberger, Michael ; Hänni, Simon ; Boccard, Mathieu ; Despeisse, Matthieu ; Haug, Franz-Josef ; Meillaud, Fanny ; Ballif, Christophe
Author_Institution :
Photovoltaics & Thin Film Electron. Lab., Ecole Polytech. Fed. de Lausanne (EPFL), Neuchâtel, Switzerland
Volume :
4
Issue :
3
fYear :
2014
fDate :
May-14
Firstpage :
757
Lastpage :
762
Abstract :
High-efficiency thin-film silicon triple-junction solar cells in p-i-n configuration have been fabricated using amorphous silicon top cell absorber layers, as well as microcrystalline silicon middle and bottom cell absorbers. The triple-junction cells were fabricated on boron doped zinc oxide (ZnO) films with different surface morphologies. To this end, the naturally grown rough ZnO surfaces were flattened using an Ar plasma for three different treatment times. For the shortest time, we achieved a summed current density over 30 mA/cm2 and initial and stabilized conversion efficiencies of 13.5% and 12.5%, respectively. For the medium treatment time, we obtained the highest efficiencies (13.7% initial and 12.8% stable), whereas the longest treatment time led to the highest open-circuit voltage (VOC) of 1.91 V but lower current densities, leading to efficiencies of 12.9% initial and 12.2% stable, respectively. These results were obtained by combining various recently developed features and approaches: first of all, we implemented high-quality μc-Si:H cells with novel buffer layers, leading to very high efficiencies. Second, we applied randomly textured pyramids on the front glass to improve light in-coupling, and finally, we used very thin (~140 nm) top cells that led to a low light-induced degradation (5%-7% relative loss in efficiency).
Keywords :
boron; elemental semiconductors; hydrogen; plasma materials processing; semiconductor thin films; semiconductor-insulator-semiconductor devices; silicon compounds; solar cells; surface treatment; zinc compounds; Ar plasma; Si:H-Si:H-Si:H; ZnO:B; amorphous silicon top cell absorber layers; boron doped zinc oxide films; buffer layers; current density; high efficiency thin film silicon triple junction solar cells; high quality hydrogen doped microc-Si cells; highly transparent front electrodes; microcrystalline silicon bottom cell absorbers; microcrystalline silicon middle cell absorbers; naturally grown rough ZnO surfaces; open circuit voltage; p-i-n configuration; randomly textured pyramids; stabilized conversion efficiencies; surface morphology; triple junction cells; voltage 1.91 V; Current density; Electrodes; Photovoltaic cells; Photovoltaic systems; Silicon; Zinc oxide; Light-trapping; multijunction solar cells; thin-film silicon;
fLanguage :
English
Journal_Title :
Photovoltaics, IEEE Journal of
Publisher :
ieee
ISSN :
2156-3381
Type :
jour
DOI :
10.1109/JPHOTOV.2014.2307162
Filename :
6762842
Link To Document :
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