DocumentCode :
2692061
Title :
The dual role of PZT in metal-PZT-Al2O3 structure for nonvolatile memory cell
Author :
Cui, Sharon ; Eun, Dongseog ; Marinkovic, Bozidar ; Peng, Cheng-Yi ; Pan, Xiao ; Sun, Xiao ; Köser, Hür ; Ma, T.P.
Author_Institution :
Yale Univ., New Haven, CT, USA
fYear :
2010
fDate :
16-19 May 2010
Firstpage :
1
Lastpage :
2
Abstract :
We have shown that the metal-PZT-Al2O3 memory stack exhibits much larger than usual memory window, in the direction of charge-trapping effect (which is opposite to the polarization switching effect) which we attribute to the enhanced charge injection due to the large polarization field of the PZT. Other attractive properties such as excellent endurance characteristics and good retention make the metalPZT-Al2O3 memory stack a promising candidate for nonvolatile memory technology. Although the memory stack used in this study contains relatively thick PZT that necessitates high P/E voltages, our preliminary results have shown much lower P/E voltages for thinner PZT, and results for such scaled memory stacks will be reported at the conference.
Keywords :
polarisation; random-access storage; Al2O3; charge-trapping effect; endurance characteristics; enhanced charge injection; memory stack; metal-PZT-Al2O3 structure; nonvolatile memory cell; polarization field; polarization switching effect; Aluminum oxide; Annealing; Capacitance-voltage characteristics; Dielectric substrates; Ferroelectric materials; Grain boundaries; Mechanical factors; Nonvolatile memory; Polarization; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Memory Workshop (IMW), 2010 IEEE International
Conference_Location :
Seoul
Print_ISBN :
978-1-4244-6719-8
Electronic_ISBN :
978-1-4244-7668-8
Type :
conf
DOI :
10.1109/IMW.2010.5488383
Filename :
5488383
Link To Document :
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