• DocumentCode
    2692079
  • Title

    Bandgap dependence of band-to-band tunneling and defect-mediated excess currents in SiGe/Si heterojunction tunnel diodes grown by RTCVD

  • Author

    Li, Jiun-Yun ; Sturm, James C. ; Majumdar, A. ; Lauer, I. ; Koester, S.

  • Author_Institution
    Dept. of Electr. Eng., Princeton Univ., Princeton, NJ, USA
  • fYear
    2009
  • fDate
    22-24 June 2009
  • Firstpage
    99
  • Lastpage
    100
  • Abstract
    There is great interest in SiGe/Si heterojunction tunnel diodes for novel devices such as sharp subthreshold slope MOSFET\´s. High tunneling current densities are a clear goal (for MOSFET drive current, e.g.). This work presents two clear results: (i) a direct measurement of the dependences on bandgap (Ge fraction) of the direct tunneling current vs. the "excess" defect-assisted tunneling current, and (ii) the highest direct tunneling currents (NDR current peaks) observed in Si-based heterojunction diodes grown by chemical vapor deposition. In summary, we have shown SiGe/Si tunnel diodes with high peak current density and a clear trend of more dominant band-to-band tunneling over excess current as bandgap is reduced.
  • Keywords
    Ge-Si alloys; III-V semiconductors; MOSFET; chemical vapour deposition; energy gap; tunnel diodes; RTCVD; SiGe/Si heterojunction tunnel diodes; SiGeSi; band-to-band tunneling; bandgap dependence; chemical vapor deposition; defect-mediated excess currents; sharp subthreshold slope MOSFET; Chemical vapor deposition; Current density; Current measurement; Diodes; Germanium silicon alloys; Heterojunctions; MOSFET circuits; Photonic band gap; Silicon germanium; Tunneling;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Device Research Conference, 2009. DRC 2009
  • Conference_Location
    University Park, PA
  • Print_ISBN
    978-1-4244-3528-9
  • Electronic_ISBN
    978-1-4244-3527-2
  • Type

    conf

  • DOI
    10.1109/DRC.2009.5354859
  • Filename
    5354859