DocumentCode :
2692321
Title :
Plasma Enhanced Cvd Method For Simultaneous Deposition On Both Sides Of The Substrate And Lts Application To The In-line Multilayer Deposition System
Author :
Kokaku, Y. ; Inaba, H. ; Kataoka, H. ; Abe, K. ; Sunagawa, M.
fYear :
1993
fDate :
9-11 Jun 1993
Firstpage :
18
Lastpage :
21
Keywords :
Electric potential; Electrodes; Magnetic films; Optical films; Plasma applications; Plasma materials processing; Plasma measurements; Plasma transport processes; Substrates; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronic Manufacturing Technology Symposium, 1993., Proceedings of 1993 Japan International
Print_ISBN :
0-7803-1432-8
Type :
conf
DOI :
10.1109/IEMT.1993.639285
Filename :
639285
Link To Document :
بازگشت