• DocumentCode
    2692643
  • Title

    Atomistic deconstruction of clear performance advantages of a monolithically patterned wide-narrow-wide all-graphene FET

  • Author

    Unluer, D. ; Tseng, Fan-Shuo ; Ghosh, Avik W. ; Stan, M.R. ; Brown, C.L.

  • Author_Institution
    ECE Dept., Univ. of Virginia, Charlottesville, VA, USA
  • fYear
    2009
  • fDate
    22-24 June 2009
  • Firstpage
    75
  • Lastpage
    76
  • Abstract
    Summary form only given. Experiments show that wide GNRs are all metallic while ultra thin ribbons (<10 nm in width) are all semiconducting and the bandgap increases as the width get narrower. This leads us to design an all a graphene nanoribbon field effect transistor (GNRFET) and atomistically simulate its transport properties. We expect this system to benefit from the unique 2-D electrostatics of the source-drain regions and the covalent bonding at the contact-channel interfaces.
  • Keywords
    electrostatics; energy gap; field effect transistors; nanostructured materials; 2D electrostatics; GNR; atomistic deconstruction; bandgap; contact-channel interfaces; covalent bonding; graphene nanoribbon field effect transistor; monolithically patterned wide-narrow-wide all-graphene FET; source-drain regions; transport property; ultra thin ribbons; Dielectric substrates; Electrostatics; FETs; Geometry; High K dielectric materials; High-K gate dielectrics; Schottky barriers; Semiconductivity; Solid modeling; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Device Research Conference, 2009. DRC 2009
  • Conference_Location
    University Park, PA
  • Print_ISBN
    978-1-4244-3528-9
  • Electronic_ISBN
    978-1-4244-3527-2
  • Type

    conf

  • DOI
    10.1109/DRC.2009.5354895
  • Filename
    5354895