DocumentCode :
2692986
Title :
Amorphous carbon film preparation by shunting arc discharge in vacuum
Author :
Yukimura, Ken ; Kumagai, Motoya ; Takaki, Koichi
Author_Institution :
Doshisha Univ., Kyoto, Japan
Volume :
1
fYear :
2003
fDate :
15-18 June 2003
Firstpage :
567
Abstract :
Diamond-like carbon film (DLC) was deposited by PBII&D method using a carbon shunting arc discharge in vacuum. The prepared film was in a state of amorphous and its surface is clean and smooth. A pulse or DC voltage of 0 to -15 kV is applied to the substrate with any filtering method to eliminate droplets. A future prospect of the various film preparations using the shunting arc discharge was also discussed.
Keywords :
amorphous state; diamond-like carbon; films; plasma immersion ion implantation; substrates; vacuum arcs; vacuum breakdown; 0 to 15 kV; DC voltage; DLC; amorphous carbon film preparation; diamond-like carbon film; plasma-based ion implantation and deposition; pulse voltage; shunting arc discharge; substrate; Amorphous materials; Arc discharges; Capacitors; Diamond-like carbon; Optical films; Plasma materials processing; Plasma sources; Surface discharges; Vacuum arcs; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Pulsed Power Conference, 2003. Digest of Technical Papers. PPC-2003. 14th IEEE International
Conference_Location :
Dallas, TX, USA
Print_ISBN :
0-7803-7915-2
Type :
conf
DOI :
10.1109/PPC.2003.1277775
Filename :
1277775
Link To Document :
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