Simulation and microfabrication of polysilicon structures used as mass sensitive sensors for gas detection

Author

Moldovan, Carinen ; Kim, Byong-Hak ; Raible, S. ; Moagar, Victor

Author_Institution

Nat. Inst., Bucharest, Romania

Volume

2

fYear

2000

fDate

2000

Firstpage

459

Abstract

The paper presents the simulation, the technological process and the fabrication of polysilicon structures used as mass sensitive sensors for gas detection. The microstructures are double ended polysilicon microbridges, released by sacrificial layer technique. The surface micromachining compatibility with integrated circuits microfabrication is followed and the bridge oscillation is tested

Keywords

Q-factor; elemental semiconductors; etching; gas sensors; micromachining; micromechanical resonators; microsensors; semiconductor device models; silicon; ANSYS analysis; CMOS detection circuit; Q factor; Si; bridge oscillation; double ended polysilicon microbridges; electrostatic activation; etching; gas detection; mass sensitive sensors; microfabrication; microstructures; polysilicon structures; resonant frequency; sacrificial layer technique; simulation; surface micromachining compatibility; Bridge circuits; Circuit simulation; Circuit testing; Fabrication; Gas detectors; Integrated circuit technology; Integrated circuit testing; Micromachining; Microstructure; Paper technology;

fLanguage

English

Publisher

ieee

Conference_Titel

Semiconductor Conference, 2000. CAS 2000 Proceedings. International

Conference_Location

Sinaia

Print_ISBN

0-7803-5885-6

Type

conf

DOI

10.1109/SMICND.2000.889131

Filename

889131