DocumentCode :
2693926
Title :
Opportunities for employing silicon carbide in high power photo-switches
Author :
Nunnally, W. ; Mazzola, M.
Author_Institution :
Dept. of Electr. & Comput. Eng., Missouri Univ., Columbia, MO, USA
Volume :
2
fYear :
2003
fDate :
15-18 June 2003
Firstpage :
823
Abstract :
High electric field geometries for high power, photoconductive switches made possible by employing subbandgap energy photons and inter-bandgap dopants / defects are being investigated for compact pulse power systems. The high field, long absorption depth package reduces the required linear mode, optical closure energy and also reduces the conduction current density through the active material and at the contacts. This paper describes the opportunities for employing semi-insulating SiC wafer in the University of Missouri-Columbia, high electric field configuration. The parameters of semi-insulating SiC materials and methods of fabricating such materials into a high power photo-switch are discussed. In addition, transient modeling of the transverse injection of optical closure energy is discussed.
Keywords :
energy gap; photoconducting switches; pulsed power switches; silicon compounds; wafer bonding; wide band gap semiconductors; SiC; University of Missouri-Columbia; compact pulse power systems; conduction current density; electric field configuration; high electric field geometries; inter-bandgap dopants; optical closure energy; photoconductive switches; semi-insulating SiC wafer; subbandgap energy photons; Absorption; Conducting materials; Current density; Geometrical optics; Optical materials; Optical switches; Packaging; Photoconductivity; Pulse power systems; Silicon carbide;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Pulsed Power Conference, 2003. Digest of Technical Papers. PPC-2003. 14th IEEE International
Conference_Location :
Dallas, TX, USA
Print_ISBN :
0-7803-7915-2
Type :
conf
DOI :
10.1109/PPC.2003.1277936
Filename :
1277936
Link To Document :
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