• DocumentCode
    2694100
  • Title

    Single crystal PZT thin film membrane with highly conductive electrodes

  • Author

    Yin, Sha ; Abergel, J. ; Bontempi, A. ; Ricart, T. ; Le Rhun, G. ; Defay, E. ; Niu, Guolin ; Vilquin, B. ; Gautier, B. ; Robach, Y.

  • Author_Institution
    CEA-LETI, Grenoble, France
  • fYear
    2012
  • fDate
    7-10 Oct. 2012
  • Firstpage
    792
  • Lastpage
    794
  • Abstract
    Piezoelectric membrane based on single crystalline Pb(Zr0.52Ti0.48)O3 (PZT) thin film on (001) Si substrate is reported in this paper. To obtain epitaxial single crystalline PZT thin film, SrTiO3 (STO) buffer layer was grown by Molecular Beam Epitaxy on Si substrate, which has been proven as an effective way to increase the crystalline quality. 70nm-thick PZT thin film was deposited on STO-buffered Si substrate by the sol-gel method. 100nm-thick Ru top electrode was patterned by wet etching and subsequently 200nm-thick SiO2 elastic layer was deposited on the top of the stack in order to mechanically strengthen the final membrane. Deep reactive ion etching was therefore used to release the membrane from the backside. Finally, 100nm-thick Au bottom electrode was deposited on the backside of the membrane. Two types of membrane structures were realized, i.e. piezoelectric actuator and resonator. The resonances were studied by an impedance meter and the hysteresis loop of the electromechanical response was characterized by a Wyko profilometer.
  • Keywords
    epitaxial layers; ferroelectric thin films; lead compounds; membranes; molecular beam epitaxial growth; sol-gel processing; sputter etching; Si(001) substrate; Si-PZT-SrTiO3-Ru; Wyko profilometer; buffer layer; crystalline quality; deep reactive ion etching; elastic layer; electromechanical response; epitaxial single crystalline PZT thin film; highly conductive electrodes; hysteresis loop; impedance meter; mechanical strengthening; molecular beam epitaxy; piezoelectric actuator; resonances; resonator; single crystal PZT thin film membrane; size 100 nm; size 200 nm; sol-gel method; wet etching; Electrodes; Etching; Gold; Molecular beam epitaxial growth; Silicon; Substrates; X-ray scattering;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Ultrasonics Symposium (IUS), 2012 IEEE International
  • Conference_Location
    Dresden
  • ISSN
    1948-5719
  • Print_ISBN
    978-1-4673-4561-3
  • Type

    conf

  • DOI
    10.1109/ULTSYM.2012.0197
  • Filename
    6562385