Carbon based layers - preparation, characterisation and applications

Author

Kleps, I. ; Albella, J.M. ; Stamatin, Ioan ; Angelescu, A. ; Samfirescu, N. ; Miu, M. ; Avram, M.

Author_Institution

Nat. Inst. for Res. & Dev. in Microtechnol., Bucharest, Romania

Volume

2

fYear

2000

fDate

2000

Firstpage

527

Abstract

Carbon based layers such as silicon carbide (SiC) and diamond-like carbon (DLC) layers were obtained by CVD methods. The properties of these layers were investigated in order to establish the optimum preparation conditions for different microsystems applications. So, silicon membranes using α-SiC or DLC layers as etching mask, as well as silicon carbide membranes using a combined porous silicon-DLC structure were fabricated for sensor applications. A detailed evaluation of the field emission (FE) properties of these films was done to demonstrate their capability to be used in field emission devices

Keywords

CVD coatings; carbon; electron field emission; membranes; microsensors; silicon compounds; vacuum microelectronics; C; CVD; SiC; carbon-based layer; diamond-like carbon; etching mask; field emission device; microsystem technology; porous silicon-DLC structure; sensor; silicon carbide; silicon carbide membrane; silicon membrane; Carbon dioxide; Diamond-like carbon; Etching; Materials science and technology; Morphology; Physics; Semiconductor films; Silicon carbide; Substrates; Temperature;

fLanguage

English

Publisher

ieee

Conference_Titel

Semiconductor Conference, 2000. CAS 2000 Proceedings. International

Conference_Location

Sinaia

Print_ISBN

0-7803-5885-6

Type

conf

DOI

10.1109/SMICND.2000.889148

Filename

889148