• DocumentCode
    2695292
  • Title

    A micromachined low-power temperature-regulated bandgap voltage reference

  • Author

    Reay, R.J. ; Klaassen, E.H. ; Kovacs, G.T.A.

  • Author_Institution
    Center for Integrated Syst., Stanford Univ., CA, USA
  • fYear
    1995
  • fDate
    15-17 Feb. 1995
  • Firstpage
    166
  • Lastpage
    167
  • Abstract
    This paper describes a temperature regulated bandgap voltage reference fabricated in a foundry CMOS process. Using a simple post-processing micromachining step, a small portion of the chip containing the reference circuitry is thermally isolated from the rest of the silicon die. Having high thermal resistance and small thermal mass, the reference requires 200 times less power and warms up 160 times faster than previous heated-substrate circuits. The reference, in a standard CMOS process, can be included on-chip with CMOS data converters and mixed-signal products.
  • Keywords
    CMOS integrated circuits; micromachining; reference circuits; Si; foundry CMOS process; low-power bandgap voltage reference; micromachining; on-chip circuitry; silicon die; temperature regulation; thermal mass; thermal resistance; thermally isolation; CMOS technology; Circuit testing; Isolation technology; Paper technology; Passivation; Photonic band gap; Silicon; Solid state circuits; Temperature; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State Circuits Conference, 1995. Digest of Technical Papers. 41st ISSCC, 1995 IEEE International
  • Conference_Location
    San Francisco, CA, USA
  • ISSN
    0193-6530
  • Print_ISBN
    0-7803-2495-1
  • Type

    conf

  • DOI
    10.1109/ISSCC.1995.535507
  • Filename
    535507