DocumentCode
2695292
Title
A micromachined low-power temperature-regulated bandgap voltage reference
Author
Reay, R.J. ; Klaassen, E.H. ; Kovacs, G.T.A.
Author_Institution
Center for Integrated Syst., Stanford Univ., CA, USA
fYear
1995
fDate
15-17 Feb. 1995
Firstpage
166
Lastpage
167
Abstract
This paper describes a temperature regulated bandgap voltage reference fabricated in a foundry CMOS process. Using a simple post-processing micromachining step, a small portion of the chip containing the reference circuitry is thermally isolated from the rest of the silicon die. Having high thermal resistance and small thermal mass, the reference requires 200 times less power and warms up 160 times faster than previous heated-substrate circuits. The reference, in a standard CMOS process, can be included on-chip with CMOS data converters and mixed-signal products.
Keywords
CMOS integrated circuits; micromachining; reference circuits; Si; foundry CMOS process; low-power bandgap voltage reference; micromachining; on-chip circuitry; silicon die; temperature regulation; thermal mass; thermal resistance; thermally isolation; CMOS technology; Circuit testing; Isolation technology; Paper technology; Passivation; Photonic band gap; Silicon; Solid state circuits; Temperature; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State Circuits Conference, 1995. Digest of Technical Papers. 41st ISSCC, 1995 IEEE International
Conference_Location
San Francisco, CA, USA
ISSN
0193-6530
Print_ISBN
0-7803-2495-1
Type
conf
DOI
10.1109/ISSCC.1995.535507
Filename
535507
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