Title :
AlGaAs/GaAs Heterojunction Bipolar Transistors with 4W/mm Power Density at X-Band
Author :
Bayraktaroglu, B. ; Camilleri, N. ; Shih, H.D. ; Tserng, H.Q.
fDate :
May 9 1975-June 11 1987
Abstract :
Fabrication and microwave characterization of X-band AIGaAs/GaAs heterojunction bipolar transistors are described. MBE was used to prepare the device structure with heavily doped (1x10/sup 19/cm/sup -3/) 1000A thick base layers. Two 2 µm x 10 µm emitter fingers separated by 2 µm (total emitter periphery of 40 µm) were used in a self-aligned emitter-base configuration. From the S-parameter measurements f/sub t/ and f/sub max/ values of 25 and 20 GHz respectively were determined. Devices operating under CW conditions produced 80 mW CW output power (2W/mm of emitter periphery) with 4 dB gain and 23% power added efficiency at 10 GHz. Under 0.25 µs pulses, 160 mW output power (4 W/mm) was obtained with 4 dB gain and 35% power added efficiency.
Keywords :
Bipolar transistors; Etching; FETs; Fabrication; Frequency; Gain; Gallium arsenide; Heterojunction bipolar transistors; Molecular beam epitaxial growth; Power generation;
Conference_Titel :
Microwave Symposium Digest, 1987 IEEE MTT-S International
Conference_Location :
Palo Alto, CA, USA
DOI :
10.1109/MWSYM.1987.1132583