Title :
NO reduction by a pulsed ammonia radical injection using one-cycle sinusoidal power source
Author :
Yukimura, Ken ; Yamamoto, Kiwamu ; Kambara, Shinji ; Maruyama, Toshiro
Author_Institution :
Doshisha Univ., Kyoto, Japan
Abstract :
NO in N/sub 2/ gas was removed by injecting ammonia radicals, which were externally generated by flowing the NH/sub 3/ gas diluted with Ar gas through dielectric barrier discharge with a one-cycle sinusoidal-wave power source. The generated ammonia radicals were introduced in a reaction chamber and mixed with NO gas, which was diluted with N/sub 2/. The discharge was intermittently formed between coaxial cylindrical electrodes with a space of 1.5 mm at an applied peak-to-peak voltage of 3-25 kV. A stepwise increase in NO reduction rate occurs at the critical temperature, which increases with increasing the NO and NH/sub 3/ concentrations. The NO gas contained 2-5.6 % O/sub 2/, and the effect of O/sub 2/ on De-NOx was also discussed. An appropriate concentration of O/sub 2/ gas promoted the De-NO/sub x/, but excess O/sub 2/ hindered De-NOx by newly generating NO. There are optimum conditions for NOx reduction and for its energy efficiency in the NH/sub 3/ concentration, the NH/sub 3/ flow rate, the repetition rate, and the applied voltage. Under a set of the optimum values of these conditions, the maximum value of the energy efficiency, 140 g/kWh, was obtained at a NO concentration of 908 ppm.
Keywords :
ammonia; argon; discharges (electric); electrodes; electron emission; energy conservation; 3 to 25 kV; NH/sub 3/; NO reduction; coaxial cylindrical electrodes; energy efficiency; one-cycle sinusoidal power source; peak-to-peak voltage; pulsed ammonia radical injection; reaction chamber; Argon; Coaxial components; Dielectrics; Energy efficiency; Fault location; Nitrogen; Plasma temperature; Power generation; Resistance heating; Voltage;
Conference_Titel :
Pulsed Power Conference, 2003. Digest of Technical Papers. PPC-2003. 14th IEEE International
Conference_Location :
Dallas, TX, USA
Print_ISBN :
0-7803-7915-2
DOI :
10.1109/PPC.2003.1278041