DocumentCode :
2696533
Title :
Indium aggregated quantum dot structures in InGaN compounds
Author :
Yang, C.C. ; Feng, Shih-Wei ; Cheng, Yung-Chen ; Chung, Yi-Yin ; Lin, En-Chiang ; Wang, Hsiang-Chen ; Tang, Tsung-Yi ; Deng, Chih-Chung ; Lin, Si-Jiung ; Ma, Kung-Jen ; Lin, Yen-Sheng
Author_Institution :
Graduate Inst. of Electro-Opt. Eng., Nat. Taiwan Univ., Taipei, Taiwan
fYear :
2003
fDate :
12-14 Sept. 2003
Firstpage :
27
Lastpage :
30
Abstract :
We will summarize the optical characteristics and microstructures of the indium-aggregated quantum dots in InGaN compounds, including intended InGaN/GaN quantum well structures and InGaN epi-layers. In quantum well structures, the dependencies of optical properties and material structures on well width and nominal indium content are to be discussed. Also, the effects of silicon doping will be reported. Furthermore, the effects of post-growth thermal annealing on the formation of quantum dot-like structures and their variations of optical properties will be presented. In InGaN epi-layers, we have studied the optical and material properties of such films with high indium contents. From the images of cathodo-luminescence and high-resolution transmission electron microscopy, quantum dot structures could be observed. After thermal annealing, the original yellow emission became blue in color in one of the samples. In the other sample, the original red emission became the combination of red, yellow and blue photons, leading to white in color.
Keywords :
III-V semiconductors; aggregation; annealing; cathodoluminescence; crystal microstructure; gallium compounds; indium compounds; photoluminescence; semiconductor doping; semiconductor epitaxial layers; semiconductor quantum dots; semiconductor quantum wells; silicon; transmission electron microscopy; wide band gap semiconductors; InGaN compounds; InGaN epilayers; InGaN-GaN; InGaN/GaN quantum well structures; blue photons; cathodoluminescence; high-resolution transmission electron microscopy; indium aggregated quantum dot structures; material structures; microstructures; nominal indium content; optical characteristics; post-growth thermal annealing; quantum dot-like structures; red emission; red photons; silicon doping; well width; yellow emission; yellow photons; Annealing; Electron optics; Gallium nitride; Indium; Microstructure; Optical films; Optical materials; Quantum dots; Silicon; Stimulated emission;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Optoelectronics, Proceedings of the Sixth Chinese Symposium
Print_ISBN :
0-7803-7887-3
Type :
conf
DOI :
10.1109/COS.2003.1278157
Filename :
1278157
Link To Document :
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