Title :
A photo detector with enhanced charge storage capacity for 2D image applications
Author :
Fann, S.S. ; Jiang, Y.L. ; Hwang, H.L.
Author_Institution :
Dept. of Electr. Eng., Lee-Ming Inst. of Technol., Taipei, Taiwan
Abstract :
An innovative photo detector structure with the enhanced charge storage capacity for two-dimensional image applications has been investigated in this work. Although the structure of the detector is very simple that an additional insulation layer is inserted between the metal electrode and the p- or n-layer of a photo diode, the charge storage capacitance can be increased up to 4 times of the junction capacitance of a reverse biased amorphous silicon p-i-n diode. The enhanced charge storage capacity of each pixel conducts that the signal dynamic range of a two-dimensional image array to be increased, and the linearity as well as the data retention time be also increased. Based on this structure, the performance of a hydrogenated amorphous silicon p-i-n photodiode, with a silicon nitride insulator layer, coupled with calcium tungstate scintillator acts as an x-ray detector was reported in this paper.
Keywords :
X-ray detection; amorphous semiconductors; capacitance; elemental semiconductors; insulating materials; optical images; p-i-n photodiodes; photodetectors; silicon; 2D image applications; X-ray detector; calcium tungstate scintillator; charge storage capacitance; data retention time; enhanced charge storage capacity; hydrogenated amorphous silicon p-i-n photodiode; insulation layer; junction capacitance; metal electrode; n-layer; p-layer; photodetector; reverse biased amorphous silicon p-i-n diode; signal dynamic range; silicon nitride insulator layer; two-dimensional image applications; two-dimensional image array; Amorphous silicon; Capacitance; Detectors; Dynamic range; Electrodes; Image storage; Insulation; Linearity; P-i-n diodes; Pixel;
Conference_Titel :
Optoelectronics, Proceedings of the Sixth Chinese Symposium
Print_ISBN :
0-7803-7887-3
DOI :
10.1109/COS.2003.1278164