Title : 
Large-area monolithic photonic crystal mirrors with high reflectivity in the 1250–1650nm band patterned by optical lithography
         
        
            Author : 
Jung, Il Woong ; Mallick, Shrestha Basu ; Solgaard, Olav
         
        
            Author_Institution : 
Dept. of Electr. Eng., Stanford Univ., Stanford, CA
         
        
        
        
        
        
            Abstract : 
This paper describes large area (500 mum - 500 mum) monolithic 2-D photonic crystals (PC) for applications as high-reflectivity, broad-band mirrors in the near-IR (infra-red) spectrum. These large PC mirrors were patterned using an ASM-L i-line stepper to achieve minimum feature sizes of less than 100 nm. The reflectivity spectrum of the mirrors show that the high reflectivity (>90%) bands can be shifted in wavelength by varying the hole sizes of the photonic crystal to cover the 400 nm near-IR band from 1250 nm-1650 nm.
         
        
            Keywords : 
micromirrors; optical fabrication; optical materials; photolithography; photonic crystals; reflectivity; ASM-L i-line stepper; broad-band mirrors; monolithic photonic crystal mirror; near-IR spectrum; optical lithography; reflectivity; wavelength 1250 nm to 1650 nm; Etching; Fabrication; Lithography; Mirrors; Optical films; Oxidation; Personal communication networks; Photonic crystals; Reflectivity; Silicon; GOPHER; Photonic crystal; broad-band; monolithic;
         
        
        
        
            Conference_Titel : 
Optical MEMs and Nanophotonics, 2008 IEEE/LEOS Internationall Conference on
         
        
            Conference_Location : 
Freiburg
         
        
            Print_ISBN : 
978-1-4244-1917-3
         
        
            Electronic_ISBN : 
978-1-4244-1918-0
         
        
        
            DOI : 
10.1109/OMEMS.2008.4607841