Title :
Optical scanner with deformable mirror fabricated from SOI wafer
Author :
Sasaki, Takashi ; Hane, Kazuhiro
Author_Institution :
Dept. of Nanomech., Tohoku Univ., Sendai
Abstract :
An optical scanner with a deformable mirror is fabricated using SOI wafer. A 1 mum thick top silicon layer of SOI wafer is used to fabricate a deformable mirror. Movable comb and fixed comb are fabricated from the silicon substrate. The mirror is rotated by the comb actuator and it is also deformed by an electrostatic force independently. The rotation angle of the mirror is 12 degrees at 80 V. The deformation at the mirror center is 3 nm at 100 V.
Keywords :
electrostatic actuators; mirrors; optical fabrication; optical scanners; silicon-on-insulator; surface roughness; SOI wafer; Si; comb actuator; deformable mirror; electronic connections; electrostatic force; optical scanner; rotation angle; silicon substrate; surface roughness; voltage 100 V; voltage 80 V; Counting circuits; Electrodes; Etching; Gold; Mirrors; Optical films; Semiconductor films; Silicon; Substrates; Voltage; SOI wafer; scanner; wave front control;
Conference_Titel :
Optical MEMs and Nanophotonics, 2008 IEEE/LEOS Internationall Conference on
Conference_Location :
Freiburg
Print_ISBN :
978-1-4244-1917-3
Electronic_ISBN :
978-1-4244-1918-0
DOI :
10.1109/OMEMS.2008.4607846
