Title :
Fabrication of sub-micrometer Si spheres with atomic-scale surface smoothness using homogenized KrF excimer laser reformation system
Author :
Hung, Shih-Che ; Shiu, Shu-Chia ; Chao, Cha-Hsin ; Lin, Ching-Fuh
Author_Institution :
Grad. Inst. of Photonics & Optoelectron., Nat. Taiwan Univ., Taipei
Abstract :
In this paper, a novel technique using the homogenized KrF excimer laser reformation is presented as an alternative method for fabricating Si spheres.
Keywords :
elemental semiconductors; excimer lasers; integrated optics; krypton compounds; laser materials processing; optical materials; silicon; surface topography; surface treatment; KrF; Si; atomic-scale surface smoothness; homogenized excimer laser reformation system; integrated optical devices; sub-micrometer silicon spheres fabrication; Atom lasers; Atom optics; Atomic beams; Lighting; Optical device fabrication; Optical pulses; Rough surfaces; Scanning electron microscopy; Surface emitting lasers; Surface roughness;
Conference_Titel :
Optical MEMs and Nanophotonics, 2008 IEEE/LEOS Internationall Conference on
Conference_Location :
Freiburg
Print_ISBN :
978-1-4244-1917-3
Electronic_ISBN :
978-1-4244-1918-0
DOI :
10.1109/OMEMS.2008.4607860
