Title :
Design and fabrication of compact etched diffraction grating demultiplexers based on α-Si nanowire technology
Author :
Song, Jun ; Zhu, Ning
Author_Institution :
Centre for Opt. & Electromagn. Res., Zhejiang Univ., Hangzhou
Abstract :
Silicon nanowire waveguides and related etched diffraction grating (EDG) demultiplexers are studied by alpha-Si-on-SiO2 technology. Compact EDG demultiplexers with 10 nm spacing for both echelle and total-internal-reflection (TIR) facets have been fabricated and characterized.
Keywords :
demultiplexing equipment; diffraction gratings; elemental semiconductors; nanotechnology; nanowires; optical communication equipment; optical design techniques; optical fabrication; optical waveguide components; silicon; silicon-on-insulator; EDG demultiplexers; Si-SiO2; echelle; etched diffraction grating demultiplexer design; silicon nanowire waveguides; total-internal-reflection facet fabrication; Arrayed waveguide gratings; Diffraction gratings; Electromagnetic waveguides; Etching; Fabrication; Optical scattering; Optical waveguides; Scanning electron microscopy; Silicon; Tellurium;
Conference_Titel :
Optical MEMs and Nanophotonics, 2008 IEEE/LEOS Internationall Conference on
Conference_Location :
Freiburg
Print_ISBN :
978-1-4244-1917-3
Electronic_ISBN :
978-1-4244-1918-0
DOI :
10.1109/OMEMS.2008.4607872
