DocumentCode
2697334
Title
Fabrication of wall-coated Cs vapor cells for a chip-scale atomic clock
Author
Hasegawa, M. ; Dziuban, P. ; Nieradko, L. ; Douahi, A. ; Gorecki, C. ; Giordano, V.
Author_Institution
Inst. FEMTO-ST, Univ. de Franche-Comte, Besancon
fYear
2008
fDate
11-14 Aug. 2008
Firstpage
162
Lastpage
163
Abstract
Cesium vapor microcells incorporating a Cs dispenser were fabricated. An organosilane monolayer was successfully applied to the microcell walls as an anti-relaxation coating to improve the relaxation time of Cs atoms.
Keywords
atomic clocks; caesium; micro-optomechanical devices; monolayers; optical fabrication; photolithography; Cs; anti-relaxation coating; cesium atoms; cesium dispenser; chip-scale atomic clock; optical characterization; organosilane monolayer; photolithography; relaxation time; wall-coated cesium vapor cell fabrication; Atomic clocks; Atomic layer deposition; Coatings; Fabrication; Glass; Microcell networks; Probes; Temperature; Wafer bonding; Wavelength measurement;
fLanguage
English
Publisher
ieee
Conference_Titel
Optical MEMs and Nanophotonics, 2008 IEEE/LEOS Internationall Conference on
Conference_Location
Freiburg
Print_ISBN
978-1-4244-1917-3
Electronic_ISBN
978-1-4244-1918-0
Type
conf
DOI
10.1109/OMEMS.2008.4607879
Filename
4607879
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