Title :
Silicon microdisplay with photo-alignment
Author :
Zhang, B.L. ; Li, K.K. ; Huang, H.C. ; Kwok, H.S.
Author_Institution :
Dept. of Electr. & Electron. Eng., Hong Kong Univ. of Sci. & Technol., Kowloon, China
Abstract :
A reflective mode liquid crystal microdisplay is presented using photo-alignment technology. The alignment layer, SD1, was aligned by three-step UV exposure process and MTN 90° mode is chosen to evaluate the performance. The comparison shows that the photo-alignment is comparable with and even better than the rubbing method in some aspect, such as sharper RVC curve and higher contrast ratio.
Keywords :
dyes; electro-optical effects; liquid crystal on silicon; microdisplays; molecular reorientation; ultraviolet radiation effects; RVC curve; SD1; alignment layer; contrast ratio; photo-alignment; reflective mode liquid crystal microdisplay; silicon microdisplay; three-step UV exposure process; Active matrix liquid crystal displays; Active matrix technology; Crystallization; Integrated circuit technology; Liquid crystal on silicon; Microdisplays; Optical films; Optical polarization; Surface topography; Thin film transistors;
Conference_Titel :
Optoelectronics, Proceedings of the Sixth Chinese Symposium
Print_ISBN :
0-7803-7887-3
DOI :
10.1109/COS.2003.1278209
