• DocumentCode
    2697867
  • Title

    Progressive Schottky junction reaction induced degradation in Pt-sunken gate InP HEMT MMICs for high reliability applications

  • Author

    Chou, Y.C. ; Leung, D.L. ; Biedenbender, M. ; Buttari, D. ; Eng, D.C. ; Tsai, R.S. ; Lin, C.H. ; Lee, L.S. ; Mei, X.B. ; Wojtowicz, M. ; Barsky, M.E. ; Lai, R. ; Oki, A.K. ; Block, T.R.

  • Author_Institution
    Microelectron. Processes & Products Center, Northrop Grumman Corp., Redondo Beach, CA, USA
  • fYear
    2010
  • fDate
    2-6 May 2010
  • Firstpage
    807
  • Lastpage
    812
  • Abstract
    Reliability performance of 0.1-μm Pt-sunken gate InP HEMT MMICs on 4-inch InP substrates was evaluated under elevated temperature life testing. The primary degradation mechanism was observed to be the progressive Schottky junction reaction with the Schottky barrier InAlAs and the InGaAs channel. Despite the progressive Schottky junction reaction with the InAlAs and InGaAs materials, the lifetest at Tambient of 280°C projects the median-time-to-failure exceeding 1×106 hours at Tchannel of 125°C. This result indicates that the promising initial reliability performance was achieved on Pt-sunken gate InP HEMT MMICs on 4-inch InP substrates.
  • Keywords
    MMIC; Schottky barriers; high electron mobility transistors; indium compounds; microwave field effect transistors; platinum; semiconductor device reliability; InP; Pt; Pt-sunken gate InP HEMT MMIC degradation; Schottky barrier channel; elevated temperature life testing; progressive Schottky junction reaction; reliability performance; size 0.1 nm; size 4 inch; temperature 125 degC; temperature 280 degC; Degradation; HEMTs; Indium compounds; Indium gallium arsenide; Indium phosphide; Integrated circuit reliability; MMICs; Space technology; Temperature; mHEMTs; HEMT; InP; MMICs; Pt-sunken gate; Schottky junction degradation; lifetest; reliability;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Reliability Physics Symposium (IRPS), 2010 IEEE International
  • Conference_Location
    Anaheim, CA
  • ISSN
    1541-7026
  • Print_ISBN
    978-1-4244-5430-3
  • Type

    conf

  • DOI
    10.1109/IRPS.2010.5488728
  • Filename
    5488728