DocumentCode :
2698434
Title :
Structural and electrical properties of SiO2 thin films produced by the different methods
Author :
Pérez-Bueno, J.J. ; Ramirez-Bon, R. ; Espinoza-Beltran, F. ; Vorobiev, Yu.V. ; Gonzalez-Hernández, J.
Author_Institution :
CINVESTAV-IPN
fYear :
2000
fDate :
2000
Firstpage :
17
Lastpage :
20
Keywords :
Copper; Dielectric breakdown; Dielectric measurements; Dielectric substrates; Ethanol; Optical films; Plasma temperature; Semiconductor films; Sputtering; Transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Advanced Semiconductor Devices and Microsystems, 2000. ASDAM 2000. The Third International EuroConference on
Print_ISBN :
0-7803-5939-9
Type :
conf
DOI :
10.1109/ASDAM.2000.889444
Filename :
889444
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2698434
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