DocumentCode :
2698649
Title :
Formation of laterally displaced porous silicon filters using different fabrication methods
Author :
Marso, M. ; Wolter, M. ; Arens-Fischer, R. ; Kordog, P. ; Lüth, H.
Author_Institution :
Institut fur Schicht- und lonentechnik
fYear :
2000
fDate :
2000
Firstpage :
95
Lastpage :
98
Keywords :
Etching; Finite impulse response filter; Optical device fabrication; Optical filters; Optical refraction; Optical sensors; Optical superlattices; Optical variables control; Refractive index; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Advanced Semiconductor Devices and Microsystems, 2000. ASDAM 2000. The Third International EuroConference on
Print_ISBN :
0-7803-5939-9
Type :
conf
DOI :
10.1109/ASDAM.2000.889458
Filename :
889458
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2698649
بازگشت