DocumentCode :
2699695
Title :
Delta-doped layer influence on Schottky diodes parameters
Author :
Osvald, J.
Author_Institution :
Inst. of Electr. Eng., Czechoslovak Acad. of Sci., Bratislava, Slovakia
fYear :
2000
fDate :
2000
Firstpage :
391
Lastpage :
394
Abstract :
We studied the influence of planar δ-doping on the parameters of Schottky diodes. It is shown that a δ-layer with the same type of conductivity as a base semiconductor material has no significant influence on the diode parameters. Changing the potential barrier shape after insertion of the δ-doped layer influences the diode current only slightly. Significant changes were found for Schottky diodes with δ-doped layers of opposite type conductivity compared with the base semiconductor. The resulting barriers are higher and depend on both the δ-doped layer position and the doping concentration
Keywords :
III-V semiconductors; Schottky diodes; gallium arsenide; semiconductor device measurement; semiconductor device models; semiconductor doping; δ-doped layer; δ-doped layer position; GaAs; GaAs Schottky diode parameters; diode current; doping concentration; ideality factor; numerical method; planar δ-doping; potential barrier shape; Charge carrier processes; Conductivity; Electron mobility; Gallium arsenide; Ohmic contacts; Poisson equations; Schottky diodes; Semiconductor device doping; Semiconductor diodes; Semiconductor materials;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Advanced Semiconductor Devices and Microsystems, 2000. ASDAM 2000. The Third International EuroConference on
Conference_Location :
Smolenice
Print_ISBN :
0-7803-5939-9
Type :
conf
DOI :
10.1109/ASDAM.2000.889528
Filename :
889528
Link To Document :
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