DocumentCode :
2699948
Title :
Validating foundry technologies for extended mission profiles
Author :
van Dijk, K. ; Volf, P.A.J. ; Detcheverry, C. ; Yau, A. ; Ngan, P. ; Liang, Z. ; Kuper, F.G.
Author_Institution :
NXP Semicond., Nijmegen, Netherlands
fYear :
2010
fDate :
2-6 May 2010
Firstpage :
111
Lastpage :
116
Abstract :
This paper presents a process qualification and characterization strategy that can extend the foundry process reliability potential to meet specific automotive mission profile requirements. In this case study, data and analyses are provided that lead to sufficient confidence for pushing the allowed mission profile envelope of a process towards more aggressive (automotive) applications.
Keywords :
CMOS integrated circuits; integrated circuit reliability; CMOS process; automotive mission profile requirements; foundry process reliability; foundry technologies; process characterization strategy; process qualification; Automotive engineering; Data analysis; Foundries; Life testing; Performance evaluation; Qualifications; Robustness; Stress; Temperature distribution; Voltage; HTOL; SRAM Vddmin; guard band; ppm level; qualification strategy; test screens;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Reliability Physics Symposium (IRPS), 2010 IEEE International
Conference_Location :
Anaheim, CA
ISSN :
1541-7026
Print_ISBN :
978-1-4244-5430-3
Type :
conf
DOI :
10.1109/IRPS.2010.5488845
Filename :
5488845
Link To Document :
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