Title :
Identification and application of current compliance failure phenomenon in RRAM device
Author :
Gao, B. ; Chang, W.Y. ; Sun, B. ; Zhang, H.W. ; Liu, L.F. ; Liu, X.Y. ; Han, R.Q. ; Wu, T.B. ; Kang, J.F.
Author_Institution :
Inst. of Microelectron., Peking Univ., Beijing, China
Abstract :
A new current sweep measurement method is introduced to investigate the details of the set process. The electrode-dependent current compliance failure phenomenon is investigated in oxide-based resistive switching memory. The results indicate that the amount of conductive filaments formed in the oxide layer is the critical factor that influences the set behavior (sudden or slowly) and causes the compliance failure. The different switching behaviors measured by the current sweep mode could be used as a criterion for distinguishing the RRAM devices from the applications of 1D1R or multilevel storage.
Keywords :
electric current measurement; integrated circuit design; random-access storage; RRAM device; conductive filaments; current sweep measurement method; electrode-dependent current compliance failure phenomenon; multilevel storage; oxide layer; Breakdown voltage; Current measurement; Electric variables measurement; Electrical resistance measurement; Electrodes; Hafnium oxide; Microelectronics; Sun; Tellurium; Tin;
Conference_Titel :
VLSI Technology Systems and Applications (VLSI-TSA), 2010 International Symposium on
Conference_Location :
Hsinchu
Print_ISBN :
978-1-4244-5063-3
Electronic_ISBN :
1524-766X
DOI :
10.1109/VTSA.2010.5488912