DocumentCode :
2701068
Title :
The distribution of boron and arsenic in SOI wafers implementing SIMS
Author :
Biswas, Santosh ; Kelly, Ivan ; Kirkwood, D. ; Collart, E.
fYear :
2002
fDate :
22-27 Sept. 2002
Firstpage :
1
Lastpage :
4
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on
Print_ISBN :
0-7803-7155-0
Type :
conf
DOI :
10.1109/IIT.2002.1278881
Filename :
1278881
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2701068
