Title :
Evaluations for a highly scalable, reliable vertical channel SONOS memory
Author :
Huang, Y.F. ; Chen, K.F. ; Chen, K.Y. ; Wei, K.L. ; Chen, Y.J. ; Hsu, M.C. ; Wu, G.W. ; Yang, I.C. ; Han, T.T. ; Chong, L.H. ; Gu, S.H. ; Zous, N.K. ; Chen, M.S. ; Lu, W.P. ; Chen, K.C. ; Lu, Chih-Yuan
Author_Institution :
Macronix Int. Co., Ltd., Hsinchu, Taiwan
Abstract :
A vertical channel SONOS memory, which is compatible with current CMOS process and has four physical storage nodes per unit area, is fabricated and electrically evaluated. Comparing with a planar device, the array cell tuning is much easier since the channel length is no longer limited by array area. After reviewing key performances including program/erase (P/E) speeds, second bit effect, program disturbance, endurance, and retention on a NOR-type array, it is found that four physical bits/cell is hard to achieve due to a serious program disturb. Unavoidable high energy 2nd hot electron between neighbor cells is identified as the root cause. In this paper, operation procedures and array layouts, which are suitable for three physical bits per cell (3bits/cell), is then proposed.
Keywords :
CMOS memory circuits; NOR circuits; integrated memory circuits; CMOS process; NOR-type array; high energy 2nd hot electron; physical storage; vertical channel SONOS memory; CMOS process; Channel hot electron injection; Charge carrier processes; Degradation; Hot carriers; Interface states; Merging; SONOS devices; Temperature; Virtual colonoscopy;
Conference_Titel :
VLSI Technology Systems and Applications (VLSI-TSA), 2010 International Symposium on
Conference_Location :
Hsinchu
Print_ISBN :
978-1-4244-5063-3
Electronic_ISBN :
1524-766X
DOI :
10.1109/VTSA.2010.5488947