DocumentCode :
2701883
Title :
Optimization of parametric yield: A tutorial
Author :
Director, S.W. ; Feldmann, Peter ; Krishna, K.
fYear :
1992
fDate :
3-6 May 1992
Abstract :
Yield loss can be characterized as either catastrophic or parametric. Catastrophic yield loss is primarily due to local, or spot, defects that occur in a manufacturing process. On the other hand, parametric yield loss is due to global disturbances, such as mask misalignment. In this paper we briefy eqdore these two different types of yield loss and then review some methods that have been developed to maximize parametric yield.
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Custom Integrated Circuits Conference, 1992., Proceedings of the IEEE 1992
Conference_Location :
Boston, MA, USA
Print_ISBN :
0-7803-0246-X
Type :
conf
DOI :
10.1109/CICC.1992.589963
Filename :
5727276
Link To Document :
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