• DocumentCode
    2701883
  • Title

    Optimization of parametric yield: A tutorial

  • Author

    Director, S.W. ; Feldmann, Peter ; Krishna, K.

  • fYear
    1992
  • fDate
    3-6 May 1992
  • Abstract
    Yield loss can be characterized as either catastrophic or parametric. Catastrophic yield loss is primarily due to local, or spot, defects that occur in a manufacturing process. On the other hand, parametric yield loss is due to global disturbances, such as mask misalignment. In this paper we briefy eqdore these two different types of yield loss and then review some methods that have been developed to maximize parametric yield.
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Custom Integrated Circuits Conference, 1992., Proceedings of the IEEE 1992
  • Conference_Location
    Boston, MA, USA
  • Print_ISBN
    0-7803-0246-X
  • Type

    conf

  • DOI
    10.1109/CICC.1992.589963
  • Filename
    5727276