SEM-EDX investigations of magnetron sputtered ZnO thin films

Author

Jian Wei Hoon ; Chan, Kah Yoong ; Krishnasamy, Jegenathan ; Wong, Hin Yong ; Tou, Teck Yong

Author_Institution

Fac. of Eng., Centre for Adv. Devices & Syst. (CADS), Multimedia Univ., Cyberjaya, Malaysia

fYear

2011

fDate

17-19 Oct. 2011

Firstpage

1

Lastpage

3

Abstract

Zinc oxide (ZnO) is a promising electronic material for transparent electronic applications including thin-film sensors, transistors and solar cells. In this work, we investigated the influence of direct current (DC) magnetron sputtering process parameter on ZnO films using scanning electron microscopy (SEM). The experimental results reveal an enhancement of the structural properties with increasing argon (Ar) pressure. The influence of the Ar pressure will be discussed in this paper.

Keywords

II-VI semiconductors; X-ray chemical analysis; scanning electron microscopy; semiconductor growth; semiconductor thin films; sputter deposition; wide band gap semiconductors; zinc compounds; EDX; SEM; ZnO; direct current; electronic material; magnetron sputtering process; scanning electron microscopy; solar cell; thin film; transistor; Argon; Atomic layer deposition; Magnetic films; Optical films; Optical pumping; Optical sensors; Zinc oxide;

fLanguage

English

Publisher

ieee

Conference_Titel

Photonics (ICP), 2011 IEEE 2nd International Conference on

Conference_Location

Kata Kinabalu

Print_ISBN

978-1-61284-265-3

Electronic_ISBN

978-1-61284-263-9

Type

conf

DOI

10.1109/ICP.2011.6106835

Filename

6106835