DocumentCode :
2702836
Title :
Geometry and layout dependency of high frequency performance of high speed bipolar transistors
Author :
van Wijnen, P.J. ; de Jong, J.L. ; van Schravendijk, B.
Author_Institution :
Phillips Res. & Dev. Center, Sunnyvale, CA, USA
fYear :
1990
fDate :
17-18 Sep 1990
Firstpage :
110
Lastpage :
113
Abstract :
Experimental data on the geometry and layout dependence of the high-frequency performance of single polysilicon bipolar transistors are presented. It is shown that small-signal high-frequency measurements provide quantitative information that can be used for the optimization of device structures and device layout. It is determined that for this technology the optimum emitter sizes are in the range of Se≈1 μm by Le=2-4 μm. These results illustrate the importance of accurate small-signal high-frequency characterization as a tool for the optimization of the geometry and layout of bipolar transistors. It quantifies how much one can gain or lose by adopting certain device sizes and design rules
Keywords :
bipolar transistors; microwave measurement; semiconductor device testing; solid-state microwave devices; 1 micron; 2 to 4 micron; DC current gain; geometry dependence; high frequency performance; high speed bipolar transistors; layout dependence; microwave probing; optimization; optimum emitter sizes; polysilicon bipolar transistors; small-signal high-frequency measurements; Bipolar transistors; Capacitance; Capacitance-voltage characteristics; Circuit simulation; Frequency measurement; Geometry; Research and development; Semiconductor device modeling; Signal processing; Solid modeling;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Bipolar Circuits and Technology Meeting, 1990., Proceedings of the 1990
Conference_Location :
Minneapolis, MN
Type :
conf
DOI :
10.1109/BIPOL.1990.171139
Filename :
171139
Link To Document :
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