New Technological Approaches for the Fabrication of Planar Photonic Crystals on III-V Compounds

Author

Martínez, L.J. ; Alija, A.R. ; González, Y. ; González, L. ; Dotor, M.L. ; Golmayo, D. ; Balcells, L. ; Postigo, P.A.

Author_Institution

Inst. de Microelectronica de Madrid, Consejo Superior de Investigaciones Cientificas, Madrid

Volume

4

fYear

2006

fDate

18-22 June 2006

Firstpage

271

Lastpage

271

Abstract

Summary form only given: We have developed new technological approaches for the fabrication of planar photonic crystals on III-V compounds. We have used electron beam (e-beam) lithography in combination with reactive ion beam etching (RIBE) and reactive ion etching (RIE) and different reactive and non-reactive chemistries (Ar, CCl₂F₂ and Cl₂) to fabricate two-dimensional photonic crystals (planar) on GaAs-based semiconductor compounds. Also, we have used e-beam lithography on flowable oxides and epitaxial regrowth by molecular beam epitaxy (MBE) to obtain a photonic crystal nanopattern. Finally, focused ion beam etching (FIB) has been used to successfully fabricate photonic crystal structures on III-V semiconductor heterostructures

Keywords

III-V semiconductors; electron beam lithography; focused ion beam technology; gallium arsenide; gallium compounds; indium compounds; integrated optics; molecular beam epitaxial growth; nanopatterning; optical fabrication; photonic crystals; semiconductor epitaxial layers; semiconductor growth; sputter etching; GaAs-InGaAsN; GaAs-based semiconductor compounds; III-V compounds; III-V semiconductor heterostructures; InGaAsP-InP; electron beam lithography; epitaxial regrowth; flowable oxides; focused ion beam etching; molecular beam epitaxy; nonreactive chemistries; photonic crystal cavity; photonic crystal fabrication; photonic crystal nanopattern; planar photonic crystals; reactive chemistries; reactive ion beam etching; reactive ion etching; two-dimensional photonic crystals; Chemical technology; Chemistry; Electron beams; Etching; Fabrication; III-V semiconductor materials; Ion beams; Lithography; Molecular beam epitaxial growth; Photonic crystals;

fLanguage

English

Publisher

ieee

Conference_Titel

Transparent Optical Networks, 2006 International Conference on

Conference_Location

Nottingham

Print_ISBN

1-4244-0235-2

Type

conf

DOI

10.1109/ICTON.2006.248475

Filename

4013929