• DocumentCode
    2703311
  • Title

    Interfacial adhesion of fluoropolymer composites to commercial copper foils subjected to aqueous photolithographic processes

  • Author

    Matienzo, L.J. ; Jimarez, L.J.

  • Author_Institution
    Microelectron. Div., IBM Corp., Endicott, NY, USA
  • fYear
    1995
  • fDate
    21-24 May 1995
  • Firstpage
    707
  • Lastpage
    718
  • Abstract
    Three commercial copper foils containing various degrees of surface roughness and a chemically similar surface treatment were laminated to a fluoropolymer composite and also subjected to water-based photolithographic and stripping processes. Surface analysis performed on the processed foils indicated that the highly basic pH of the stripping process was effective in removing zinc oxide, a component of the surface treatments on these foils. Morphologically, however, the surfaces did not seem to change. Ninety degree peel measurements of the resulting interfaces with and without a photoresist processes showed that the resulting practical adhesion seemed to be mainly controlled by mechanical interlocking and to a lesser amount, by chemical factors. When 50 μm wide lines were subjected to the photolithographic process and a full fabrication sequence, adhesion variability seemed to be affected by interfacial attack of the fluoropolymer/metal foil interface by the alkaline medium of stripping and other process chemicals. Reliable interfacial adhesion of narrow lines is only possible when process parameters have been optimized
  • Keywords
    adhesion; composite material interfaces; copper; filled polymers; foils; photolithography; polymer films; printed circuit manufacture; surface topography; surface treatment; 50 micron; Cu; PCB fabrication; ZnO removal; adhesion variability; alkaline medium; aqueous photolithographic processes; chemical factors; commercial Cu foils; fluoropolymer composites; fluoropolymer/metal foil interface; interfacial adhesion; mechanical interlocking; narrow line adhesion; ninety degree peel measurements; process chemicals; process parameters optimisation; stripping process; surface analysis; surface roughness; surface treatment; water-based photolithographic process; Adhesives; Chemical processes; Copper; Mechanical variables measurement; Performance analysis; Rough surfaces; Surface morphology; Surface roughness; Surface treatment; Zinc oxide;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronic Components and Technology Conference, 1995. Proceedings., 45th
  • Conference_Location
    Las Vegas, NV
  • Print_ISBN
    0-7803-2736-5
  • Type

    conf

  • DOI
    10.1109/ECTC.1995.517766
  • Filename
    517766