DocumentCode :
2703352
Title :
Radio frequency power sensor based on MEMS technology
Author :
Fernandez, Luis J. ; Visser, Eelke ; Sese, Javier ; Wiegerink, Remco ; Flokstra, Jaap ; Jansen, Henri ; Elwenspoek, Miko
Author_Institution :
Inst. for Nanotechnology, Twente Univ., Enschede, Netherlands
Volume :
1
fYear :
2003
fDate :
22-24 Oct. 2003
Firstpage :
549
Abstract :
We present the first measurement results of a power sensor for radio frequency (rf) signals (50 kHz - 40 GHz) with almost no dissipation during the measurement. This sensor is, therefore, a ´through´ power sensor, that means that the rf signal is available during the measurement of its power. The power detection has been realized by measuring capacitively the movement of a grounded aluminum membrane, which is suspended above the transmission line carrying the rf signal. The power sensor is thus a capacitive MEMS technology based sensor. The fabrication is done by aluminum surface micromachining on an AF45 glass wafer. We measured the capacitance as a function of the applied rf power and found a linear relationship as predicted from theory.
Keywords :
micromachining; micromechanical devices; microwave detectors; power measurement; 50E-6 to 40 GHz; AF45 glass wafer; aluminum surface micromachining; capacitive MEMS technology; grounded aluminum membrane; power detection; radio frequency power sensor; rf signal; transmission line; Aluminum; Biomembranes; Capacitive sensors; Frequency measurement; Micromechanical devices; Motion measurement; Power measurement; RF signals; Radio frequency; Transmission line measurements;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Sensors, 2003. Proceedings of IEEE
Print_ISBN :
0-7803-8133-5
Type :
conf
DOI :
10.1109/ICSENS.2003.1278998
Filename :
1278998
Link To Document :
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