• DocumentCode
    2703352
  • Title

    Radio frequency power sensor based on MEMS technology

  • Author

    Fernandez, Luis J. ; Visser, Eelke ; Sese, Javier ; Wiegerink, Remco ; Flokstra, Jaap ; Jansen, Henri ; Elwenspoek, Miko

  • Author_Institution
    Inst. for Nanotechnology, Twente Univ., Enschede, Netherlands
  • Volume
    1
  • fYear
    2003
  • fDate
    22-24 Oct. 2003
  • Firstpage
    549
  • Abstract
    We present the first measurement results of a power sensor for radio frequency (rf) signals (50 kHz - 40 GHz) with almost no dissipation during the measurement. This sensor is, therefore, a ´through´ power sensor, that means that the rf signal is available during the measurement of its power. The power detection has been realized by measuring capacitively the movement of a grounded aluminum membrane, which is suspended above the transmission line carrying the rf signal. The power sensor is thus a capacitive MEMS technology based sensor. The fabrication is done by aluminum surface micromachining on an AF45 glass wafer. We measured the capacitance as a function of the applied rf power and found a linear relationship as predicted from theory.
  • Keywords
    micromachining; micromechanical devices; microwave detectors; power measurement; 50E-6 to 40 GHz; AF45 glass wafer; aluminum surface micromachining; capacitive MEMS technology; grounded aluminum membrane; power detection; radio frequency power sensor; rf signal; transmission line; Aluminum; Biomembranes; Capacitive sensors; Frequency measurement; Micromechanical devices; Motion measurement; Power measurement; RF signals; Radio frequency; Transmission line measurements;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Sensors, 2003. Proceedings of IEEE
  • Print_ISBN
    0-7803-8133-5
  • Type

    conf

  • DOI
    10.1109/ICSENS.2003.1278998
  • Filename
    1278998