Title :
Sputter Deposition of Nanostructured TiO2 Thin Films
Author :
HoraÌkovaÌ, Marta ; CernyÌ, Pavel ; KriÌzÌŒ, Pavel ; BartosÌŒ, Petr ; SÌŒpatenka, Petr
Author_Institution :
Dept. of Appl. Phys. & Technol., Univ. of South Bohemia, Ceské Budejovice, Czech Republic
Abstract :
A physical vapor deposition (PVD) method using plasma discharge-glancing angle deposition (GLAD), based on a variation of the particle´s incidence angle to the substrate, enables the formation of TiO2 thin films with oriented columnar nanostructure. The incidence angle influences crystalline, nanostructure, and surface properties of the deposited films. Images illustrating the GLAD PVD method and scanning electron microscopy images of the TiO2 thin films deposited with different incidence angles α are presented.
Keywords :
nanofabrication; nanoparticles; plasma deposition; scanning electron microscopy; sputter deposition; thin films; titanium compounds; TiO2; crystalline properties; nanostructured TiO2 thin films; oriented columnar nanostructure; particle incidence angle; physical vapor deposition; plasma discharge-glancing angle deposition; scanning electron microscopy; sputter deposition; surface properties; Educational institutions; Scanning electron microscopy; Sputtering; Substrates; Surface morphology; Surface treatment; Magnetrons; plasma applications; scanning electron microscopy; sputtering; sputtering.;
Journal_Title :
Plasma Science, IEEE Transactions on
DOI :
10.1109/TPS.2014.2326896
