DocumentCode :
2704052
Title :
Multilevel interconnection and electrode separation technology using anodic oxidation and application to unidirectional surface acoustic wave transducers
Author :
Yamanouchi, Kazuhiko ; Meguro, Toshiyasu
Author_Institution :
Res. Inst. of Electr. Commun., Tohoku Univ., Sendai, Japan
fYear :
1990
fDate :
12-13 Jun 1990
Firstpage :
380
Abstract :
Summary form only given. A description is given of a new multilevel interconnection using a technology in which surfaces of electrodes connected to the anodic oxidation power source are oxidized and changed to the dielectric layers. The surfaces of unconnected electrodes do not change and can be fabricated by using a simple photomask and rough mask alignment. Also described is a new electrode separation fabrication technology using a liftoff anodic oxidation method. Electrode separations are obtained using dielectric thin films fabricated by anodic oxidation of the edge of an Al film covered by the photoresist. The fabrication technology has the following merits: (1) controllable narrow gaps between electrodes with good insulation; (2) a wide electrode with small resistance; and (3) a wide photomask
Keywords :
metallisation; oxidation; surface acoustic wave devices; Al film; dielectric layers; electrode separation technology; fabrication technology; liftoff anodic oxidation method; multilevel interconnection; photomask; photoresist; surface acoustic wave; unidirectional SAW transducers; Conductivity; Dielectric thin films; Electrodes; Fabrication; Filters; Insertion loss; Oxidation; Rough surfaces; Surface acoustic wave devices; Surface roughness;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
VLSI Multilevel Interconnection Conference, 1990. Proceedings., Seventh International IEEE
Conference_Location :
Santa Clara, CA
Type :
conf
DOI :
10.1109/VMIC.1990.127904
Filename :
127904
Link To Document :
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