Title :
KrF excimer laser lithography with high sensitivity positive resist and high power laser
Author :
Tani, Y. ; Sasago, M. ; Momura, N. ; Fujimoto, H. ; Furuya, N. ; Ono, T. ; Horiuchi, N. ; Miyata, T.
Abstract :
A positive resist with high sensitivity and stability named ASKA (Alkaline Soluble Kinematics using Acid generator) is described. A KrF excimer laser with a maximum laser power of 8.8 W and more than 109 pulses named PCR (polarization coupled resonator) is also presented. The result of KrF excimer laser lithography for 0.4-μm VLSI using this combination of ASKA and PCR technologies indicates improved throughput over conventional g-line lithography
Keywords :
VLSI; excimer lasers; krypton compounds; photolithography; photoresists; 0.4 micron; 8.8 W; ASKA; Alkaline Soluble Kinematics using Acid generator; DUV lithography; KrF excimer laser lithography; PCR; ULSI lithography; VLSI; high power laser; high sensitivity positive resist; polarization coupled resonator; submicron lithography; throughput;
Conference_Titel :
VLSI Technology, 1990. Digest of Technical Papers.1990 Symposium on
Conference_Location :
Honolulu, Hawaii, USA
DOI :
10.1109/VLSIT.1990.110981
