DocumentCode :
270755
Title :
Two-dimensional modeling of an ultra-thin body single-gate Si Tunnel-FET
Author :
Graef, Michael ; Holtij, Thomas ; Hain, Fabian ; Kloes, Alexander ; Iñíguez, Benjamin
Author_Institution :
Competence Centre for Nanotechnol. & Photonics, Tech. Hochschule Mittelhessen, Giessen, Germany
fYear :
2014
fDate :
7-9 April 2014
Firstpage :
101
Lastpage :
104
Abstract :
In the last few years the Tunnel-FET has become a promising device to be the successor of the classical MOSFET due to its steep switching behavior with subthreshold slopes (S) below 60 mV/dec. However, due to trap-assisted-tunneling (TAT) at the channel junctions the slope is significantly influenced. In this paper a 2D analytical band-to-band current model for ultra-thin body (UTB) single-gate (SG) Tunnel-FETs is presented. The model includes a solution for the trap-assisted-tunneling (TAT) current. The model results are compared against TCAD Sentaurus simulations and device measurement data.
Keywords :
elemental semiconductors; field effect transistors; silicon; tunnelling; 2D analytical band-to-band current model; Si; TAT; TCAD Sentaurus simulation; UTB SG; band-to-band current model; channel junction; steep switching behavior; subthreshold slope; trap-assisted-tunneling; two-dimensional modeling; ultrathin body single-gate Si tunnel-FET; Data models; Doping; Electric potential; Electrostatics; Junctions; Semiconductor process modeling; Tunneling; 2-D Poisson; Single-Gate (SG) Tunnel-FET; Trap-Assisted-Tunneling (TAT) Model; Ultra-Thin Body (UTB); analytical modeling; conformal mapping;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Ultimate Integration on Silicon (ULIS), 2014 15th International Conference on
Conference_Location :
Stockholm
Type :
conf
DOI :
10.1109/ULIS.2014.6813926
Filename :
6813926
Link To Document :
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