• DocumentCode
    2707935
  • Title

    Experimental study of metal-metal contact properties using spin on glass

  • Author

    Wolters, R.A.M. ; Heesters, W.C.J.

  • Author_Institution
    Philips Res. Lab., Eindhoven, Netherlands
  • fYear
    1990
  • fDate
    12-13 Jun 1990
  • Firstpage
    447
  • Lastpage
    449
  • Abstract
    Degassing data of cured spin-on glass (SOG) layers and wafer temperature measurements during the sputter etch process are given. A solution for the metal-metal contact problem using an in situ preheat step prior to a (soft) sputter etch process and subsequent metal deposition is presented. An improvement in IN-INS contact string resistance yield from approximately 40% to 99.5% could be achieved in this process
  • Keywords
    VLSI; integrated circuit technology; metallisation; IN-INS contact string resistance yield; SOG; cured spin-on glass; degassing data; in situ preheat step; metal-metal contact properties; spin on glass; sputter etch process; subsequent metal deposition; wafer temperature measurements; Annealing; Contact resistance; Dielectrics; Electrical resistance measurement; Glass manufacturing; Heating; Laboratories; Performance evaluation; Sputter etching; Temperature;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    VLSI Multilevel Interconnection Conference, 1990. Proceedings., Seventh International IEEE
  • Conference_Location
    Santa Clara, CA
  • Type

    conf

  • DOI
    10.1109/VMIC.1990.127926
  • Filename
    127926
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2707935