DocumentCode :
2708379
Title :
Gain and efficiency of THz donor lasing in axially stressed silicon crystal
Author :
Shastin, V.N. ; Zhukavin, R.Kh. ; Kovalevsky, K.A. ; Tsyplenkov, V.V. ; Pavlov, S.G. ; Hübers, H.
Author_Institution :
Inst. for Phys. of Microstructures, Russian Acad. of Sci., Nizhny Novgorod, Russia
fYear :
2010
fDate :
5-10 Sept. 2010
Firstpage :
1
Lastpage :
2
Abstract :
Liquid helium temperature experimental study of terahertz (4-6 THz) lasing of optically excited group-V donors in axially compressed silicon crystal are presented and discussed.
Keywords :
elemental semiconductors; semiconductor lasers; silicon; submillimetre wave lasers; Si; axially compressed silicon crystal; frequency 4 THz to 6 THz; group-V donors; liquid helium temperature; silicon crystal; terahertz donor lasing; Bismuth; Compressive stress; Crystals; Laser excitation; Laser modes; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Infrared Millimeter and Terahertz Waves (IRMMW-THz), 2010 35th International Conference on
Conference_Location :
Rome
Print_ISBN :
978-1-4244-6655-9
Type :
conf
DOI :
10.1109/ICIMW.2010.5612342
Filename :
5612342
Link To Document :
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