Title :
Narrow width effects in CMOS n(p)-well resistors
Author :
Auricchio, C. ; Bez, R. ; Grossi, A.
Author_Institution :
SGS-Thomson Microelectron., Agrate Brianza, Italy
Abstract :
Since the CMOS processes scale down till half submicron, even the use of n(p)-well resistors may become critical due to the interaction between the small geometry and the depletion width. In this work we present a model for n(p)-well resistor that takes into account the effects of temperature variation and resistor biases on narrow width structures. The model is obviously based on free parameters that become characteristic of the particular used CMOS technology and it can be implemented in advanced circuit simulators
Keywords :
CMOS integrated circuits; integrated circuit modelling; resistors; 0.5 micron; CMOS n(p)-well resistor; bias; circuit simulation; depletion width; model; narrow width structure; temperature variation; CMOS process; CMOS technology; Circuit simulation; Geometry; Microelectronics; Research and development; Resistors; Semiconductor device modeling; Temperature; Voltage;
Conference_Titel :
Microelectronic Test Structures, 1996. ICMTS 1996. Proceedings. 1996 IEEE International Conference on
Conference_Location :
Trento
Print_ISBN :
0-7803-2783-7
DOI :
10.1109/ICMTS.1996.535614