DocumentCode :
271171
Title :
Measurement of optical parameters of thin films non-uniform in thickness
Author :
Nečas, David ; Ohlídal, Ivan ; Čudek, Vladimír ; Ohlídal, Miloslav ; Vodák, Jiří ; Zajícková, Lenka ; Majumdar, Angshul
Author_Institution :
CEITEC - Central Eur. Inst. of Technol., Masaryk Univ., Brno, Czech Republic
fYear :
2014
fDate :
24-29 Aug. 2014
Firstpage :
600
Lastpage :
601
Abstract :
A multi-pixel modification of the data fitting procedure for imaging spectroscopic reflectometry is used for the optical characterisation of thin films non-uniform in thickness. It is shown that this procedure allows a more precise and reliable determination of the optical parameters compared to the standard application of the imaging spectroscopic reflectometry. This modification is applied to SiOxCyHz and carbon nitride thin films. The optical constants of these films are verified by standard variable-angle spectroscopic ellipsometry.
Keywords :
carbon compounds; optical constants; optical films; optical variables measurement; reflectometry; silicon compounds; thickness measurement; thin films; C3N4; SiOxCyHz; data fitting procedure; imaging spectroscopic reflectometry; multipixel modification; optical parameter measurement; standard variable-angle spectroscopic ellipsometry; thin films nonuniform thickness measurement; Adaptive optics; Ellipsometry; Optical films; Optical imaging; Optical refraction; Optical variables control; Dielectric films; Ellipsometry; Imaging spectrophotometry; Non-uniformity; Photometry; Thin films;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Precision Electromagnetic Measurements (CPEM 2014), 2014 Conference on
Conference_Location :
Rio de Janeiro
ISSN :
0589-1485
Print_ISBN :
978-1-4799-5205-2
Type :
conf
DOI :
10.1109/CPEM.2014.6898528
Filename :
6898528
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=271171
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