DocumentCode
271171
Title
Measurement of optical parameters of thin films non-uniform in thickness
Author
NecÌŒas, David ; OhliÌdal, Ivan ; CÌŒudek, VladimiÌr ; OhliÌdal, Miloslav ; VodaÌk, JirÌŒiÌ ; ZajiÌckovaÌ, Lenka ; Majumdar, Angshul
Author_Institution
CEITEC - Central Eur. Inst. of Technol., Masaryk Univ., Brno, Czech Republic
fYear
2014
fDate
24-29 Aug. 2014
Firstpage
600
Lastpage
601
Abstract
A multi-pixel modification of the data fitting procedure for imaging spectroscopic reflectometry is used for the optical characterisation of thin films non-uniform in thickness. It is shown that this procedure allows a more precise and reliable determination of the optical parameters compared to the standard application of the imaging spectroscopic reflectometry. This modification is applied to SiOxCyHz and carbon nitride thin films. The optical constants of these films are verified by standard variable-angle spectroscopic ellipsometry.
Keywords
carbon compounds; optical constants; optical films; optical variables measurement; reflectometry; silicon compounds; thickness measurement; thin films; C3N4; SiOxCyHz; data fitting procedure; imaging spectroscopic reflectometry; multipixel modification; optical parameter measurement; standard variable-angle spectroscopic ellipsometry; thin films nonuniform thickness measurement; Adaptive optics; Ellipsometry; Optical films; Optical imaging; Optical refraction; Optical variables control; Dielectric films; Ellipsometry; Imaging spectrophotometry; Non-uniformity; Photometry; Thin films;
fLanguage
English
Publisher
ieee
Conference_Titel
Precision Electromagnetic Measurements (CPEM 2014), 2014 Conference on
Conference_Location
Rio de Janeiro
ISSN
0589-1485
Print_ISBN
978-1-4799-5205-2
Type
conf
DOI
10.1109/CPEM.2014.6898528
Filename
6898528
Link To Document